Fachinformationsdienst BAUdigital

A platform for research: civil engineering, architecture and urbanism

    Stability of Postannealed Silicon Dioxide Electret Thin Films Prepared by Magnetron Sputtering

    New search for: Minami, T.
    New search for: Toda, H.
    New search for: Utsubo, T.
    New search for: Miyata, T.
    New search for: Ohbayashi, Y.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Page navigation

    Document information
    Similar titles

    Export, share and cite

    Stability of Postannealed Silicon Dioxide Electret Thin Films Prepared by Magnetron Sputtering

    New search for: Minami, T.
    New search for: Toda, H.
    New search for: Utsubo, T.
    New search for: Miyata, T.
    New search for: Ohbayashi, Y.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Stability of Postannealed Silicon Dioxide Electret Thin Films Prepared by Magnetron Sputtering

    New search for: Minami, T.
    New search for: Toda, H.
    New search for: Utsubo, T.
    New search for: Miyata, T.
    New search for: Ohbayashi, Y.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Page navigation

    Document information
    Similar titles

    Export, share and cite

    Document information
    Title:

    Stability of Postannealed Silicon Dioxide Electret Thin Films Prepared by Magnetron Sputtering

    Contributors:

    Minami, T. (author) / Toda, H. (author) / Utsubo, T. (author) / Miyata, T. (author) / Ohbayashi, Y. (author)

    Published in:

    MATERIALS TRANSACTIONS ; 43 ; 946-950

    Publication date:

    2002-01-01

    Size:

    5 pages

    ISSN:

    1345-9678

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  620.11

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

    Similar titles

    LaB~x thin films prepared by magnetron sputtering

    Kinbara, A. / Nakano, T. / Kobayashi, A. et al. | British Library Online Contents | 1993

    LaB~x thin films prepared by magnetron sputtering

    Kinbara, A. / Nakano, T. / Kobayashi, A. et al. | British Library Online Contents | 1993

    Silicon Dioxide Thin Films Doped with CdS Microcrystals Grown by Magnetron rf-Sputtering

    Rolo, A. G. / Gomes, M. J. M. / Belsley, M. S. | British Library Online Contents | 1995

    Properties of TiO~2 Thin Films Prepared by Magnetron Sputtering

    Zhang, W. / Li, Y. / Wang, F. | British Library Online Contents | 2002

    Properties of zirconia thin films prepared by reactive magnetron sputtering

    Hembram, K. P. / Mohan Rao, G. | British Library Online Contents | 2007

    Back to top