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    Effect of the Substrate Thermal Expansion Coefficient on the Thermal Residual Stresses in W-Si-N Sputtered Films

    New search for: Louro, C.
    New search for: Teixeira-Dias, F.
    New search for: Menezes, L. F.
    New search for: Cavaleiro, A.
    New search for: Vieira, T.

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    Effect of the Substrate Thermal Expansion Coefficient on the Thermal Residual Stresses in W-Si-N Sputtered Films

    New search for: Louro, C.
    New search for: Teixeira-Dias, F.
    New search for: Menezes, L. F.
    New search for: Cavaleiro, A.
    New search for: Vieira, T.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Effect of the Substrate Thermal Expansion Coefficient on the Thermal Residual Stresses in W-Si-N Sputtered Films

    New search for: Louro, C.
    New search for: Teixeira-Dias, F.
    New search for: Menezes, L. F.
    New search for: Cavaleiro, A.
    New search for: Vieira, T.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

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    Check availability in my library
    Order at Subito €

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    Document information
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    Document information
    Title:

    Effect of the Substrate Thermal Expansion Coefficient on the Thermal Residual Stresses in W-Si-N Sputtered Films

    Contributors:

    Louro, C. (author) / Teixeira-Dias, F. (author) / Menezes, L. F. (author) / Cavaleiro, A. (author) / Vieira, T.

    Published in:

    Proceedings of the 1^s^t International Materials Symposium, Coimbra, Portugal, April 9-11, 2001 ; 513-516

    KEY ENGINEERING MATERIALS

    Publication date:

    2002-01-01

    Size:

    4 pages

    ISSN:

    1013-9826

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  620.11

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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