Growth and Characterization of Well-Aligned nc-Si/SiO~x Composite Nanowires: Fid-Bau Portal

Growth and Characterization of Well-Aligned nc-Si/SiO~x Composite Nanowires

Wu, J.-J. / Wong, T.-C. / Yu, C.-C.

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Growth and Characterization of Well-Aligned nc-Si/SiO~x Composite Nanowires

Wu, J.-J. / Wong, T.-C. / Yu, C.-C.

Growth and Characterization of Well-Aligned nc-Si/SiO~x Composite Nanowires

Wu, J.-J. / Wong, T.-C. / Yu, C.-C.

Access

Access via TIB

Check availability in my library

Order at Subito €

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Document information

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Document information

Title:

Growth and Characterization of Well-Aligned nc-Si/SiO~x Composite Nanowires

Contributors:

Wu, J.-J. (author) / Wong, T.-C. (author) / Yu, C.-C. (author)

Published in:

ADVANCED MATERIALS -DEERFIELD BEACH THEN WEINHEIM- ; 14 ; 1643-1646

Publication date:

2002-01-01

Size:

4 pages

ISSN:

0935-9648

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 620.11

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