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A resonance photoionization sputtered neutral mass spectrometry instrument for submicron microarea analysis of ULSI devices
A resonance photoionization sputtered neutral mass spectrometry instrument for submicron microarea analysis of ULSI devices
A resonance photoionization sputtered neutral mass spectrometry instrument for submicron microarea analysis of ULSI devices
Shichi, H. (author) / Osabe, S. (author) / Sugaya, M. (author) / Ino, T. (author) / Kakibayashi, H. (author) / Kanehori, K. (author) / Mitsui, Y. (author)
APPLIED SURFACE SCIENCE ; 203-204 ; 228-234
2003-01-01
7 pages
Article (Journal)
English
DDC:
621.35
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