Eine Plattform für die Wissenschaft: Bauingenieurwesen, Architektur und Urbanistik
A resonance photoionization sputtered neutral mass spectrometry instrument for submicron microarea analysis of ULSI devices
A resonance photoionization sputtered neutral mass spectrometry instrument for submicron microarea analysis of ULSI devices
A resonance photoionization sputtered neutral mass spectrometry instrument for submicron microarea analysis of ULSI devices
Shichi, H. (Autor:in) / Osabe, S. (Autor:in) / Sugaya, M. (Autor:in) / Ino, T. (Autor:in) / Kakibayashi, H. (Autor:in) / Kanehori, K. (Autor:in) / Mitsui, Y. (Autor:in)
APPLIED SURFACE SCIENCE ; 203-204 ; 228-234
01.01.2003
7 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
621.35
© Metadata Copyright the British Library Board and other contributors. All rights reserved.
Ultrathin silicide formation for ULSI devices
British Library Online Contents | 1997
|BASE | 2017
|Photoionization Analysis by Mass Spectroscopy
NTIS | 1958
|Resonance enhanced multi-photon ionization of neutral atoms sputtered with Ga-FIB
British Library Online Contents | 2008
|