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    Integration of high dielectric Ba0.5Sr0.5TiO3 films into amorphous TaSiN barrier layer structures

    New search for: Wenger, C.
    New search for: Albert, M.
    New search for: Adolphi, B.
    New search for: Heuer, H.
    New search for: Bartha, J. W.
    New search for: Schlenkrich, F.

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    Integration of high dielectric Ba0.5Sr0.5TiO3 films into amorphous TaSiN barrier layer structures

    New search for: Wenger, C.
    New search for: Albert, M.
    New search for: Adolphi, B.
    New search for: Heuer, H.
    New search for: Bartha, J. W.
    New search for: Schlenkrich, F.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Integration of high dielectric Ba0.5Sr0.5TiO3 films into amorphous TaSiN barrier layer structures

    New search for: Wenger, C.
    New search for: Albert, M.
    New search for: Adolphi, B.
    New search for: Heuer, H.
    New search for: Bartha, J. W.
    New search for: Schlenkrich, F.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

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    Document information
    Similar titles

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    Document information
    Title:

    Integration of high dielectric Ba0.5Sr0.5TiO3 films into amorphous TaSiN barrier layer structures

    Contributors:

    Wenger, C. (author) / Albert, M. (author) / Adolphi, B. (author) / Heuer, H. (author) / Bartha, J. W. (author) / Schlenkrich, F. (author)

    Published in:

    MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING ; 5 ; 233-236

    Publication date:

    2002-01-01

    Size:

    4 pages

    ISSN:

    1369-8001

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  621.38152

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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