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Anisotropic deposition of copper by H-assisted plasma chemical vapor deposition

Takenaka, K. / Shiratani, M. / Onishi, M. / Takeshita, M. / Kinoshita, T. / Koga, K. / Watanabe, Y.

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Anisotropic deposition of copper by H-assisted plasma chemical vapor deposition

Takenaka, K. / Shiratani, M. / Onishi, M. / Takeshita, M. / Kinoshita, T. / Koga, K. / Watanabe, Y.

Anisotropic deposition of copper by H-assisted plasma chemical vapor deposition

Takenaka, K. / Shiratani, M. / Onishi, M. / Takeshita, M. / Kinoshita, T. / Koga, K. / Watanabe, Y.

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Check availability in my library

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Document information

Title:

Anisotropic deposition of copper by H-assisted plasma chemical vapor deposition

Contributors:

Takenaka, K. (author) / Shiratani, M. (author) / Onishi, M. (author) / Takeshita, M. (author) / Kinoshita, T. (author) / Koga, K. (author) / Watanabe, Y. (author)

Published in:

MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING ; 5 ; 301-304

Publication date:

2002-01-01

Size:

4 pages

ISSN:

1369-8001

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 621.38152

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