A platform for research: civil engineering, architecture and urbanism
Auger electron spectroscopy determination of surface self-diffusion coefficients from growth of voids in thin deposited films
Auger electron spectroscopy determination of surface self-diffusion coefficients from growth of voids in thin deposited films
Auger electron spectroscopy determination of surface self-diffusion coefficients from growth of voids in thin deposited films
Beszeda, I. (author) / Szabo, I. A. (author) / Gontier-Moya, E. G. (author)
APPLIED SURFACE SCIENCE ; 212-213 ; 787-791
2003-01-01
5 pages
Article (Journal)
English
DDC:
621.35
© Metadata Copyright the British Library Board and other contributors. All rights reserved.
Determination of grain-boundary diffusion coefficients by Auger electron spectroscopy
British Library Online Contents | 2000
|Auger electron spectroscopy of super-doped Si:Mn thin films
British Library Online Contents | 1999
|Determination of alumina surface composition by Auger electron spectroscopy
British Library Online Contents | 1996
|Quantitative correction of backscattering in Auger electron spectroscopy of thin films
British Library Online Contents | 1995
|British Library Online Contents | 2011
|