Structural and Electronic Properties of a Thin Metal-Silicide Film on Silicon Surface: A First-Principles Study: Fid-Bau Portal

Structural and Electronic Properties of a Thin Metal-Silicide Film on Silicon Surface: A First-Principles Study

Kang, B. S. / Kang, H. J. / Oh, S. K.

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Structural and Electronic Properties of a Thin Metal-Silicide Film on Silicon Surface: A First-Principles Study

Kang, B. S. / Kang, H. J. / Oh, S. K.

Structural and Electronic Properties of a Thin Metal-Silicide Film on Silicon Surface: A First-Principles Study

Kang, B. S. / Kang, H. J. / Oh, S. K.

Access

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Check availability in my library

Order at Subito €

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Document information

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Document information

Title:

Structural and Electronic Properties of a Thin Metal-Silicide Film on Silicon Surface: A First-Principles Study

Contributors:

Kang, B. S. (author) / Kang, H. J. (author) / Oh, S. K. (author)

Published in:

SURFACE REVIEW AND LETTERS ; 10 ; 183-188

Publication date:

2003-01-01

Size:

6 pages

ISSN:

0218-625X

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 530.417

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