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Preparing an acrylic ester copolymer as an ultrathick negative photo resist

Cheng, T. S. / Lee, H. Y. / Lee, C. T. / Chen, H. / Lin, H. T.

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Preparing an acrylic ester copolymer as an ultrathick negative photo resist

Cheng, T. S. / Lee, H. Y. / Lee, C. T. / Chen, H. / Lin, H. T.

Preparing an acrylic ester copolymer as an ultrathick negative photo resist

Cheng, T. S. / Lee, H. Y. / Lee, C. T. / Chen, H. / Lin, H. T.

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Order at Subito €

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Document information

Title:

Preparing an acrylic ester copolymer as an ultrathick negative photo resist

Contributors:

Cheng, T. S. (author) / Lee, H. Y. (author) / Lee, C. T. (author) / Chen, H. (author) / Lin, H. T. (author)

Published in:

MATERIALS LETTERS ; 57 ; 4578-4582

Publication date:

2003-01-01

Size:

5 pages

ISSN:

0167-577X

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 620.1105 / 530

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