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Boron diffusion in silicon: the anomalies and control by point defect engineering
Boron diffusion in silicon: the anomalies and control by point defect engineering
Boron diffusion in silicon: the anomalies and control by point defect engineering
Shao, L. (author) / Liu, J. (author) / Chen, Q. Y. (author) / Chu, W. K. (author)
MATERIALS SCIENCE AND ENGINEERING R REPORTS -LAUSANNE- ; 42 ; 65-114
2003-01-01
50 pages
Article (Journal)
English
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