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A platform for research: civil engineering, architecture and urbanism
Growth studies and characterisation of In2S3 thin films deposited by atomic layer deposition (ALD)
Growth studies and characterisation of In2S3 thin films deposited by atomic layer deposition (ALD)
Growth studies and characterisation of In2S3 thin films deposited by atomic layer deposition (ALD)
Naghavi, N. (author) / Henriquez, R. (author) / Laptev, V. (author) / Lincot, D. (author)
APPLIED SURFACE SCIENCE ; 222 ; 65-73
2004-01-01
9 pages
Article (Journal)
English
DDC:
621.35
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