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XPS study of N2 annealing effect on thermal Ta2O5 layers on Si

Atanassova, E. / Tyuliev, G. / Paskaleva, A. / Spassov, D. / Kostov, K.

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XPS study of N2 annealing effect on thermal Ta2O5 layers on Si

Atanassova, E. / Tyuliev, G. / Paskaleva, A. / Spassov, D. / Kostov, K.

XPS study of N2 annealing effect on thermal Ta2O5 layers on Si

Atanassova, E. / Tyuliev, G. / Paskaleva, A. / Spassov, D. / Kostov, K.

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Check availability in my library

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Document information

Title:

XPS study of N2 annealing effect on thermal Ta2O5 layers on Si

Contributors:

Atanassova, E. (author) / Tyuliev, G. (author) / Paskaleva, A. (author) / Spassov, D. (author) / Kostov, K. (author)

Published in:

APPLIED SURFACE SCIENCE ; 225 ; 86-99

Publication date:

2004-01-01

Size:

14 pages

ISSN:

0169-4332

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 621.35

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