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Characterization of Ge-doped silica films with low optical loss grown by flame hydrolysis deposition

Zhang, L. / Wang, X. / Xie, W. / Hou, Y. / Zheng, W. / Zhang, Y.

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Characterization of Ge-doped silica films with low optical loss grown by flame hydrolysis deposition

Zhang, L. / Wang, X. / Xie, W. / Hou, Y. / Zheng, W. / Zhang, Y.

Characterization of Ge-doped silica films with low optical loss grown by flame hydrolysis deposition

Zhang, L. / Wang, X. / Xie, W. / Hou, Y. / Zheng, W. / Zhang, Y.

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Access via TIB

Check availability in my library

Order at Subito €

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Document information

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Document information

Title:

Characterization of Ge-doped silica films with low optical loss grown by flame hydrolysis deposition

Contributors:

Zhang, L. (author) / Wang, X. (author) / Xie, W. (author) / Hou, Y. (author) / Zheng, W. (author) / Zhang, Y. (author)

Published in:

MATERIALS SCIENCE AND ENGINEERING B -LAUSANNE- ; 107 ; 317-320

Publication date:

2004-01-01

Size:

4 pages

ISSN:

0921-5107

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 620.11

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