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Effect of surface stoichiometry on Be doping in GaAs by intermittent supply of AsH3 and TEG in an ultra-high vacuum
Effect of surface stoichiometry on Be doping in GaAs by intermittent supply of AsH3 and TEG in an ultra-high vacuum
Effect of surface stoichiometry on Be doping in GaAs by intermittent supply of AsH3 and TEG in an ultra-high vacuum
Ohno, T. (author) / Oyama, Y. (author) / Suto, K. (author) / Nishizawa, J. i. (author)
MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING ; 6 ; 421-424
2003-01-01
4 pages
Article (Journal)
English
DDC:
621.38152
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