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Nanometer silicon thin films prepared by HF sputtering at low temperature

Zhao, Z. / Cui, R. / Meng, F. / Zhao, B. / Yu, H. / Zhou, Z.

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Nanometer silicon thin films prepared by HF sputtering at low temperature

Zhao, Z. / Cui, R. / Meng, F. / Zhao, B. / Yu, H. / Zhou, Z.

Nanometer silicon thin films prepared by HF sputtering at low temperature

Zhao, Z. / Cui, R. / Meng, F. / Zhao, B. / Yu, H. / Zhou, Z.

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Check availability in my library

Order at Subito €

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Document information

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Document information

Title:

Nanometer silicon thin films prepared by HF sputtering at low temperature

Contributors:

Zhao, Z. (author) / Cui, R. (author) / Meng, F. (author) / Zhao, B. (author) / Yu, H. (author) / Zhou, Z. (author)

Published in:

APPLIED SURFACE SCIENCE ; 229 ; 30-33

Publication date:

2004-01-01

Size:

4 pages

ISSN:

0169-4332

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 621.35

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