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Wet treatment for preparing atomically smooth Si(100) wafer surface

Sakaue, H. / Taniguchi, Y. / Okamura, Y. / Shingubara, S. / Takahagi, T.

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Wet treatment for preparing atomically smooth Si(100) wafer surface

Sakaue, H. / Taniguchi, Y. / Okamura, Y. / Shingubara, S. / Takahagi, T.

Wet treatment for preparing atomically smooth Si(100) wafer surface

Sakaue, H. / Taniguchi, Y. / Okamura, Y. / Shingubara, S. / Takahagi, T.

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Check availability in my library

Order at Subito €

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Document information

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Document information

Title:

Wet treatment for preparing atomically smooth Si(100) wafer surface

Contributors:

Sakaue, H. (author) / Taniguchi, Y. (author) / Okamura, Y. (author) / Shingubara, S. (author) / Takahagi, T. (author)

Published in:

APPLIED SURFACE SCIENCE ; 234 ; 439-444

Publication date:

2004-01-01

Size:

6 pages

ISSN:

0169-4332

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 621.35

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