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Micro-Raman stress characterization of polycrystalline silicon films grown at high temperature

Teixeira, R. C. / Doi, I. / Zakia, M. B. / Diniz, J. A. / Swart, J. W.

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Micro-Raman stress characterization of polycrystalline silicon films grown at high temperature

Teixeira, R. C. / Doi, I. / Zakia, M. B. / Diniz, J. A. / Swart, J. W.

Micro-Raman stress characterization of polycrystalline silicon films grown at high temperature

Teixeira, R. C. / Doi, I. / Zakia, M. B. / Diniz, J. A. / Swart, J. W.

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Check availability in my library

Order at Subito €

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Document information

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Document information

Title:

Micro-Raman stress characterization of polycrystalline silicon films grown at high temperature

Contributors:

Teixeira, R. C. (author) / Doi, I. (author) / Zakia, M. B. (author) / Diniz, J. A. (author) / Swart, J. W. (author)

Published in:

MATERIALS SCIENCE AND ENGINEERING B -LAUSANNE- ; 112 ; 160-164

Publication date:

2004-01-01

Size:

5 pages

ISSN:

0921-5107

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 620.11

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