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Differences of Stark shift behavior in Si/SiO2 quantum wells and quantum dots

de Sousa, J. S. / Freire, J. A. / Freire, V. N. / Silva, E. F.

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Differences of Stark shift behavior in Si/SiO2 quantum wells and quantum dots

de Sousa, J. S. / Freire, J. A. / Freire, V. N. / Silva, E. F.

Differences of Stark shift behavior in Si/SiO2 quantum wells and quantum dots

de Sousa, J. S. / Freire, J. A. / Freire, V. N. / Silva, E. F.

Access

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Check availability in my library

Order at Subito €

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Document information

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Document information

Title:

Differences of Stark shift behavior in Si/SiO2 quantum wells and quantum dots

Contributors:

de Sousa, J. S. (author) / Freire, J. A. (author) / Freire, V. N. (author) / Silva, E. F. (author)

Published in:

APPLIED SURFACE SCIENCE ; 237 ; 544-548

Publication date:

2004-01-01

Size:

5 pages

ISSN:

0169-4332

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 621.35

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