Characterization of sputtering deposited NiTi shape memory thin films using a temperature controllable atomic force microscope: Fid-Bau Portal

Characterization of sputtering deposited NiTi shape memory thin films using a temperature controllable atomic force microscope

He, Q. / Huang, W. M. / Hong, M. H. / Wu, M. J. / Fu, Y. Q. / Chong, T. C. / Chellet, F. / Du, H. J.

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Characterization of sputtering deposited NiTi shape memory thin films using a temperature controllable atomic force microscope

He, Q. / Huang, W. M. / Hong, M. H. / Wu, M. J. / Fu, Y. Q. / Chong, T. C. / Chellet, F. / Du, H. J.

Characterization of sputtering deposited NiTi shape memory thin films using a temperature controllable atomic force microscope

He, Q. / Huang, W. M. / Hong, M. H. / Wu, M. J. / Fu, Y. Q. / Chong, T. C. / Chellet, F. / Du, H. J.

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Check availability in my library

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Document information

Title:

Characterization of sputtering deposited NiTi shape memory thin films using a temperature controllable atomic force microscope

Contributors:

He, Q. (author) / Huang, W. M. (author) / Hong, M. H. (author) / Wu, M. J. (author) / Fu, Y. Q. (author) / Chong, T. C. (author) / Chellet, F. (author) / Du, H. J. (author)

Published in:

SMART MATERIALS AND STRUCTURES ; 13 ; 977-982

Publication date:

2004-01-01

Size:

6 pages

ISSN:

0964-1726

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 530

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