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Hafnium and zirconium tetramethylnonanedionates as new MOCVD precursors for oxide films
Hafnium and zirconium tetramethylnonanedionates as new MOCVD precursors for oxide films
Hafnium and zirconium tetramethylnonanedionates as new MOCVD precursors for oxide films
Pasko, S. V. (author) / Abrutis, A. (author) / Hubert-Pfalzgraf, L. G. (author)
MATERIALS LETTERS ; 59 ; 261-265
2005-01-01
5 pages
Article (Journal)
English
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