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Simplified tunnelling current calculation for MOS structures with ultra-thin oxides for conductive atomic force microscopy investigations

Frammelsberger, W. / Benstetter, G. / Stamp, R. / Kiely, J. / Schweinboeck, T.

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Simplified tunnelling current calculation for MOS structures with ultra-thin oxides for conductive atomic force microscopy investigations

Frammelsberger, W. / Benstetter, G. / Stamp, R. / Kiely, J. / Schweinboeck, T.

Simplified tunnelling current calculation for MOS structures with ultra-thin oxides for conductive atomic force microscopy investigations

Frammelsberger, W. / Benstetter, G. / Stamp, R. / Kiely, J. / Schweinboeck, T.

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Access via TIB

Check availability in my library

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Document information

Title:

Simplified tunnelling current calculation for MOS structures with ultra-thin oxides for conductive atomic force microscopy investigations

Contributors:

Frammelsberger, W. (author) / Benstetter, G. (author) / Stamp, R. (author) / Kiely, J. (author) / Schweinboeck, T. (author)

Published in:

MATERIALS SCIENCE AND ENGINEERING B -LAUSANNE- ; 116 ; 168-174

Publication date:

2005-01-01

Size:

7 pages

ISSN:

0921-5107

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 620.11

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