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    Effecting of oxygen and chlorine on nano-structured TiN/Si3N4 films hardness

    New search for: Dayan, M.
    New search for: Shengli, M.
    New search for: Kewei, X.
    New search for: Veprek, S.

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    Effecting of oxygen and chlorine on nano-structured TiN/Si3N4 films hardness

    New search for: Dayan, M.
    New search for: Shengli, M.
    New search for: Kewei, X.
    New search for: Veprek, S.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Effecting of oxygen and chlorine on nano-structured TiN/Si3N4 films hardness

    New search for: Dayan, M.
    New search for: Shengli, M.
    New search for: Kewei, X.
    New search for: Veprek, S.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
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    Document information
    Similar titles

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    Document information
    Title:

    Effecting of oxygen and chlorine on nano-structured TiN/Si3N4 films hardness

    Contributors:

    Dayan, M. (author) / Shengli, M. (author) / Kewei, X. (author) / Veprek, S. (author)

    Published in:

    MATERIALS LETTERS ; 59 ; 838-841

    Publication date:

    2005-01-01

    Size:

    4 pages

    ISSN:

    0167-577X

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  620.1105 / 530

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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