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Highly efficient silver patterning without photo-resist using simple silver precursors

Byun, Y. / Hwang, E. C. / Lee, S. Y. / Lyu, Y. Y. / Yim, J. H. / Kim, J. Y. / Chang, S. / Pu, L. S. / Kim, J. M.

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Highly efficient silver patterning without photo-resist using simple silver precursors

Byun, Y. / Hwang, E. C. / Lee, S. Y. / Lyu, Y. Y. / Yim, J. H. / Kim, J. Y. / Chang, S. / Pu, L. S. / Kim, J. M.

Highly efficient silver patterning without photo-resist using simple silver precursors

Byun, Y. / Hwang, E. C. / Lee, S. Y. / Lyu, Y. Y. / Yim, J. H. / Kim, J. Y. / Chang, S. / Pu, L. S. / Kim, J. M.

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Document information

Title:

Highly efficient silver patterning without photo-resist using simple silver precursors

Contributors:

Byun, Y. (author) / Hwang, E. C. (author) / Lee, S. Y. (author) / Lyu, Y. Y. (author) / Yim, J. H. (author) / Kim, J. Y. (author) / Chang, S. (author) / Pu, L. S. (author) / Kim, J. M. (author)

Published in:

MATERIALS SCIENCE AND ENGINEERING B -LAUSANNE- ; 117 ; 11-16

Publication date:

2005-01-01

Size:

6 pages

ISSN:

0921-5107

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 620.11

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