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The future of high-K on pure germanium and its importance for Ge CMOS

Meuris, M. / Delabie, A. / Van Elshocht, S. / Kubicek, S. / Verheyen, P. / De Jaeger, B. / Van Steenbergen, J. / Winderickx, G. / Van Moorhem, E. / Puurunen, R. L.

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The future of high-K on pure germanium and its importance for Ge CMOS

Meuris, M. / Delabie, A. / Van Elshocht, S. / Kubicek, S. / Verheyen, P. / De Jaeger, B. / Van Steenbergen, J. / Winderickx, G. / Van Moorhem, E. / Puurunen, R. L.

The future of high-K on pure germanium and its importance for Ge CMOS

Meuris, M. / Delabie, A. / Van Elshocht, S. / Kubicek, S. / Verheyen, P. / De Jaeger, B. / Van Steenbergen, J. / Winderickx, G. / Van Moorhem, E. / Puurunen, R. L.

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Title:

The future of high-K on pure germanium and its importance for Ge CMOS

Contributors:

Meuris, M. (author) / Delabie, A. (author) / Van Elshocht, S. (author) / Kubicek, S. (author) / Verheyen, P. (author) / De Jaeger, B. (author) / Van Steenbergen, J. (author) / Winderickx, G. (author) / Van Moorhem, E. (author) / Puurunen, R. L. (author)

Published in:

MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING ; 8 ; 203-207

Publication date:

2005-01-01

Size:

5 pages

ISSN:

Type of media:

Article (Journal)

Type of material:

Print

Language:

English

Classification:

© Metadata Copyright the British Library Board and other contributors. All rights reserved.

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