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    Numerical simulation of metallic film thickness distribution deposited by electron beam co-evaporation under vacuum

    New search for: Aubreton, P.
    New search for: Bessaudou, A.
    New search for: Di Bin, C.

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    Numerical simulation of metallic film thickness distribution deposited by electron beam co-evaporation under vacuum

    New search for: Aubreton, P.
    New search for: Bessaudou, A.
    New search for: Di Bin, C.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Numerical simulation of metallic film thickness distribution deposited by electron beam co-evaporation under vacuum

    New search for: Aubreton, P.
    New search for: Bessaudou, A.
    New search for: Di Bin, C.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

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    Document information
    Similar titles

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    Document information
    Title:

    Numerical simulation of metallic film thickness distribution deposited by electron beam co-evaporation under vacuum

    Contributors:

    Aubreton, P. (author) / Bessaudou, A. (author) / Di Bin, C. (author)

    Published in:

    COMPUTATIONAL MATERIALS SCIENCE ; 33 ; 400-406

    Publication date:

    2005-01-01

    Size:

    7 pages

    ISSN:

    0927-0256

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  620.1 / 510

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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