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Numerical simulation of metallic film thickness distribution deposited by electron beam co-evaporation under vacuum
Numerical simulation of metallic film thickness distribution deposited by electron beam co-evaporation under vacuum
Numerical simulation of metallic film thickness distribution deposited by electron beam co-evaporation under vacuum
Aubreton, P. (Autor:in) / Bessaudou, A. (Autor:in) / Di Bin, C. (Autor:in)
COMPUTATIONAL MATERIALS SCIENCE ; 33 ; 400-406
01.01.2005
7 pages
Aufsatz (Zeitschrift)
Englisch
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