A platform for research: civil engineering, architecture and urbanism
Growth of MgxZn1-xO films using remote plasma MOCVD
Growth of MgxZn1-xO films using remote plasma MOCVD
Growth of MgxZn1-xO films using remote plasma MOCVD
Nakamura, A. (author) / Ishihara, J. (author) / Shigemori, S. (author) / Aoki, T. (author) / Temmyo, J. (author)
APPLIED SURFACE SCIENCE ; 244 ; 385-388
2005-01-01
4 pages
Article (Journal)
English
DDC:
621.35
© Metadata Copyright the British Library Board and other contributors. All rights reserved.
British Library Online Contents | 2011
|Growth of MgxZn1-xO film by MOCVD equipped laser heating system
British Library Online Contents | 2010
|Growth and characterization of Zn1-xCdxO films using remote plasma MOCVD
British Library Online Contents | 2005
|Growth of cubic MgxZn1-xO alloy films by electron beam evaporation
British Library Online Contents | 2007
|Properties of MgxZn1-xO thin films sputtered in different gases
British Library Online Contents | 2008
|