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Residual Stress Analysis of Microwave Plasma CVD Diamond Films

Chen, L. / Mao, W. / Lu, F. / Yang, P.

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Residual Stress Analysis of Microwave Plasma CVD Diamond Films

Chen, L. / Mao, W. / Lu, F. / Yang, P.

Residual Stress Analysis of Microwave Plasma CVD Diamond Films

Chen, L. / Mao, W. / Lu, F. / Yang, P.

Access

Access via TIB

Check availability in my library

Order at Subito €

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Document information

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Document information

Title:

Residual Stress Analysis of Microwave Plasma CVD Diamond Films

Contributors:

Chen, L. (author) / Mao, W. (author) / Lu, F. (author) / Yang, P. (author)

Published in:

MATERIALS SCIENCE FORUM ; 495/497 ; 1359-1364

Publication date:

2005-01-01

Size:

6 pages

ISSN:

0255-5476

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 620.11

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