A platform for research: civil engineering, architecture and urbanism
Sub-10 nm High-Aspect-Ratio Patterning of ZnO Using an Electron Beam
Sub-10 nm High-Aspect-Ratio Patterning of ZnO Using an Electron Beam
Sub-10 nm High-Aspect-Ratio Patterning of ZnO Using an Electron Beam
Saifullah, M. S. M. (author) / Subramanian, K. R. V. (author) / Kang, D.-J. (author) / Anderson, D. (author) / Huck, W. T. S. (author) / Jones, G. A. C. (author) / Welland, M. E. (author)
ADVANCED MATERIALS -DEERFIELD BEACH THEN WEINHEIM- ; 17 ; 1757-1761
2005-01-01
5 pages
Article (Journal)
English
DDC:
620.11
© Metadata Copyright the British Library Board and other contributors. All rights reserved.
High-aspect ratio polymeric pillar arrays formed via electrohydrodynamic patterning
British Library Online Contents | 2008
|Fabrication of high aspect ratio nanocell lattices by ion beam irradiation
British Library Online Contents | 2016
|British Library Online Contents | 2012
|Fabrication of high aspect ratio nanocell lattices by ion beam irradiation
British Library Online Contents | 2016
|