Patterning: High Aspect Ratio Sub-15 nm Silicon Trenches From Block Copolymer Templates (Adv. Mater. 42/2012): Fid-Bau Portal

Patterning: High Aspect Ratio Sub-15 nm Silicon Trenches From Block Copolymer Templates (Adv. Mater. 42/2012)

Gu, X. / Liu, Z. / Gunkel, I. / Chourou, S. T. / Hong, S. W. / Olynick, D. L. / Russell, T. P.

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Patterning: High Aspect Ratio Sub-15 nm Silicon Trenches From Block Copolymer Templates (Adv. Mater. 42/2012)

Gu, X. / Liu, Z. / Gunkel, I. / Chourou, S. T. / Hong, S. W. / Olynick, D. L. / Russell, T. P.

Patterning: High Aspect Ratio Sub-15 nm Silicon Trenches From Block Copolymer Templates (Adv. Mater. 42/2012)

Gu, X. / Liu, Z. / Gunkel, I. / Chourou, S. T. / Hong, S. W. / Olynick, D. L. / Russell, T. P.

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Title:

Patterning: High Aspect Ratio Sub-15 nm Silicon Trenches From Block Copolymer Templates (Adv. Mater. 42/2012)

Contributors:

Gu, X. (author) / Liu, Z. (author) / Gunkel, I. (author) / Chourou, S. T. (author) / Hong, S. W. (author) / Olynick, D. L. (author) / Russell, T. P. (author)

Published in:

ADVANCED MATERIALS -DEERFIELD BEACH THEN WEINHEIM- ; 24 ; 5687-5687

Publication date:

2012-01-01

Size:

1 pages

ISSN:

0935-9648

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 620.11

Gu, X. / Liu, Z. / Gunkel, I. et al. | British Library Online Contents | 2012

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Yi, H. / Bao, X. Y. / Zhang, J. et al. | British Library Online Contents | 2012

Block copolymer patterns and templates

Li, M. / Ober, C. K. | British Library Online Contents | 2006

Block Copolymer Nanostructures: Nanoscopic Morphologies in Block Copolymer Nanorods as Templates for Atomic-Layer Deposition of Semiconductors (Adv. Mater. 27/2009)

Wang, Y. / Qin, Y. / Berger, A. et al. | British Library Online Contents | 2009

Nanoscopic Templates from Oriented Block Copolymer Films

Thurn-Albrecht, T. / Steiner, R. / DeRouchey, J. et al. | British Library Online Contents | 2000