Fachinformationsdienst BAUdigital

A platform for research: civil engineering, architecture and urbanism

    The Mechanical Property of TiN Film Deposited on N^+-Implanted Aluminum by Magnetron Sputtering

    New search for: Cai, X.
    New search for: Liu, Y.
    New search for: Li, L.
    New search for: Chen, Q.
    New search for: Hu, Y.
    New search for: Kim, Y.-J.
    New search for: Bae, D.-H.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Page navigation

    Document information
    Similar titles

    Export, share and cite

    The Mechanical Property of TiN Film Deposited on N^+-Implanted Aluminum by Magnetron Sputtering

    New search for: Cai, X.
    New search for: Liu, Y.
    New search for: Li, L.
    New search for: Chen, Q.
    New search for: Hu, Y.
    New search for: Kim, Y.-J.
    New search for: Bae, D.-H.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    The Mechanical Property of TiN Film Deposited on N^+-Implanted Aluminum by Magnetron Sputtering

    New search for: Cai, X.
    New search for: Liu, Y.
    New search for: Li, L.
    New search for: Chen, Q.
    New search for: Hu, Y.
    New search for: Kim, Y.-J.
    New search for: Bae, D.-H.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Page navigation

    Document information
    Similar titles

    Export, share and cite

    Document information
    Title:

    The Mechanical Property of TiN Film Deposited on N^+-Implanted Aluminum by Magnetron Sputtering

    Contributors:

    Cai, X. (author) / Liu, Y. (author) / Li, L. (author) / Chen, Q. (author) / Hu, Y. (author) / Kim, Y.-J. / Bae, D.-H.

    Published in:

    Advances in Fracture and Strength ; 1713-1717

    KEY ENGINEERING MATERIALS ; 297/300

    Publication date:

    2005-01-01

    Size:

    5 pages

    ISSN:

    1013-9826

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  620.11

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

    Similar titles

    Field emission property of copper nitride thin film deposited by reactive magnetron sputtering

    Wang, T. / Pan, X. J. / Wang, X. M. et al. | British Library Online Contents | 2008

    Magnetron sputtering deposited MnO1.9 thin film for supercapacitor

    Li, Y. / Xie, H. / Li, J. et al. | British Library Online Contents | 2013

    Photocatalytic Property of TiO~2 Films Deposited by Pulsed DC Magnetron Sputtering

    Zhang, W. / Zhu, S. / Li, Y. et al. | British Library Online Contents | 2004

    Bismuth- and aluminum-substituted iron garnet film, deposited by rf magnetron-sputtering using a novel target

    Xiangyang, M. / Jian, S. / Shouye, Z. et al. | British Library Online Contents | 1998

    Effects of sputtering power on mechanical properties of Cr films deposited by magnetron sputtering

    Kim, K. / Park, M. / Lee, W. et al. | British Library Online Contents | 2008

    Back to top