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    X-ray Photoelectron Spectroscopy Studies of Ti~xAl~1~-~xN Thin Films Prepared by RF Reactive Magnetron Sputtering

    New search for: Xiong, R.
    New search for: Shi, J.

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    X-ray Photoelectron Spectroscopy Studies of Ti~xAl~1~-~xN Thin Films Prepared by RF Reactive Magnetron Sputtering

    New search for: Xiong, R.
    New search for: Shi, J.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    X-ray Photoelectron Spectroscopy Studies of Ti~xAl~1~-~xN Thin Films Prepared by RF Reactive Magnetron Sputtering

    New search for: Xiong, R.
    New search for: Shi, J.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

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    Check availability in my library
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    Document information
    Similar titles

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    Document information
    Title:

    X-ray Photoelectron Spectroscopy Studies of Ti~xAl~1~-~xN Thin Films Prepared by RF Reactive Magnetron Sputtering

    Contributors:

    Xiong, R. (author) / Shi, J. (author)

    Published in:

    JOURNAL OF MATERIALS SCIENCE AND TECHNOLOGY -SHENYANG- ; 21 ; 541-544

    Publication date:

    2005-01-01

    Size:

    4 pages

    ISSN:

    1005-0302

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  620.11

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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