A platform for research: civil engineering, architecture and urbanism
Modeling Analysis of Excimer Laser Crystallization of a-Si Films with Nanosecond Temperature Response
Modeling Analysis of Excimer Laser Crystallization of a-Si Films with Nanosecond Temperature Response
Modeling Analysis of Excimer Laser Crystallization of a-Si Films with Nanosecond Temperature Response
Chang, C. H. (author) / Chao, L. S. (author) / Jywe, W. / Chen, C.-L. / Fan, K.-C. / Fung, R. F. / Hanson, S. G. / Hsieh, W.-H. / Hsu, C.-L. / Huang, Y.-M.
2006-01-01
6 pages
Article (Journal)
English
DDC:
620.11
© Metadata Copyright the British Library Board and other contributors. All rights reserved.
Low-temperature crystallization induced by excimer laser irradiation of SrBi~2Ta~2O~9 films
British Library Online Contents | 2001
|Doping and crystallization of amorphous SiGe films with an excimer (KrF) laser
British Library Online Contents | 1995
|Excimer laser crystallization techniques for polysilicon TFTs
British Library Online Contents | 2000
|Simulation of composition modification in ZnSe by nanosecond radiation of excimer laser
British Library Online Contents | 2008
|Densification and crystallization of SnO2:Sb sol-gel films using excimer laser annealing
British Library Online Contents | 2003
|