Structural characteristic and thermal stability of nanoporous SiO2 low-k thin films prepared by sol-gel method with catalyst HF: Fid-Bau Portal

Structural characteristic and thermal stability of nanoporous SiO2 low-k thin films prepared by sol-gel method with catalyst HF

He, Z. W. / Liu, X. Q. / Gou, J. / Wang, Y. Y.

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Structural characteristic and thermal stability of nanoporous SiO2 low-k thin films prepared by sol-gel method with catalyst HF

He, Z. W. / Liu, X. Q. / Gou, J. / Wang, Y. Y.

Structural characteristic and thermal stability of nanoporous SiO2 low-k thin films prepared by sol-gel method with catalyst HF

He, Z. W. / Liu, X. Q. / Gou, J. / Wang, Y. Y.

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Check availability in my library

Order at Subito €

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Document information

Title:

Structural characteristic and thermal stability of nanoporous SiO2 low-k thin films prepared by sol-gel method with catalyst HF

Contributors:

He, Z. W. (author) / Liu, X. Q. (author) / Gou, J. (author) / Wang, Y. Y. (author)

Published in:

MATERIALS SCIENCE AND ENGINEERING B -LAUSANNE- ; 128 ; 168-173

Publication date:

2006-01-01

Size:

6 pages

ISSN:

0921-5107

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 620.11

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