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Low Pressure RF Plasma Jet Sputtering Technique Applied to Ferroelectric Films: Ba~1~-~x Sr~xTiO~3
Low Pressure RF Plasma Jet Sputtering Technique Applied to Ferroelectric Films: Ba~1~-~x Sr~xTiO~3
Low Pressure RF Plasma Jet Sputtering Technique Applied to Ferroelectric Films: Ba~1~-~x Sr~xTiO~3
Deyneka, A. (author) / Hubicka, Z. (author) / Trepakov, V. A. (author) / Suchaneck, G. (author) / Jastrabik, L. (author) / Gerlach, G. (author) / Pokorny, J. (author) / Chvostova, D. (author) / Olejnicek, J. (author) / Vilarinho, P. M.
2006-01-01
5 pages
Article (Journal)
English
DDC:
620.11
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