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Epitaxial growth of copper silicides by "bilayer" technique on monocrystalline silicon with and without native SiOx
Epitaxial growth of copper silicides by "bilayer" technique on monocrystalline silicon with and without native SiOx
Epitaxial growth of copper silicides by "bilayer" technique on monocrystalline silicon with and without native SiOx
Benouattas, N. (author) / Osmani, L. (author) / Salik, L. (author) / Benazzouz, C. (author) / Benkerri, M. (author) / Bouabellou, A. (author) / Halimi, R. (author)
MATERIALS SCIENCE AND ENGINEERING B -LAUSANNE- ; 132 ; 283-287
2006-01-01
5 pages
Article (Journal)
English
DDC:
620.11
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