Photostructural modifications in poly(methylphenylsilylene) thin films: Excitation wavelength and atmosphere dependence: Fid-Bau Portal

Photostructural modifications in poly(methylphenylsilylene) thin films: Excitation wavelength and atmosphere dependence

Potter, B. G. / Chandra, H. / Simmons-Potter, K. / Jamison, G. M. / Thomes, W. J.

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Photostructural modifications in poly(methylphenylsilylene) thin films: Excitation wavelength and atmosphere dependence

Potter, B. G. / Chandra, H. / Simmons-Potter, K. / Jamison, G. M. / Thomes, W. J.

Photostructural modifications in poly(methylphenylsilylene) thin films: Excitation wavelength and atmosphere dependence

Potter, B. G. / Chandra, H. / Simmons-Potter, K. / Jamison, G. M. / Thomes, W. J.

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Check availability in my library

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Document information

Title:

Photostructural modifications in poly(methylphenylsilylene) thin films: Excitation wavelength and atmosphere dependence

Contributors:

Potter, B. G. (author) / Chandra, H. (author) / Simmons-Potter, K. (author) / Jamison, G. M. (author) / Thomes, W. J. (author)

Published in:

JOURNAL OF MATERIALS RESEARCH -PITTSBURGH THEN WARRENDALE- ; 21 ; 2393-2400

Publication date:

2006-01-01

Size:

8 pages

ISSN:

0884-2914

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 620.11

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