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Influence of negative ion element impurities on laser induced damage threshold of HfO2 thin film

Wu, S. / Tian, G. / Xia, Z. / Shao, J. / Fan, Z.

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Influence of negative ion element impurities on laser induced damage threshold of HfO2 thin film

Wu, S. / Tian, G. / Xia, Z. / Shao, J. / Fan, Z.

Influence of negative ion element impurities on laser induced damage threshold of HfO2 thin film

Wu, S. / Tian, G. / Xia, Z. / Shao, J. / Fan, Z.

Access

Access via TIB

Check availability in my library

Order at Subito €

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Document information

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Document information

Title:

Influence of negative ion element impurities on laser induced damage threshold of HfO2 thin film

Contributors:

Wu, S. (author) / Tian, G. (author) / Xia, Z. (author) / Shao, J. (author) / Fan, Z. (author)

Published in:

APPLIED SURFACE SCIENCE ; 253 ; 1111-1115

Publication date:

2006-01-01

Size:

5 pages

ISSN:

0169-4332

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 621.35

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