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High laser-induced damage threshold HfO2 films prepared by ion-assisted electron beam evaporation

Zhang, D. / Fan, S. / Zhao, Y. / Gao, W. / Shao, J. / Fan, R. / Wang, Y. / Fan, Z.

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High laser-induced damage threshold HfO2 films prepared by ion-assisted electron beam evaporation

Zhang, D. / Fan, S. / Zhao, Y. / Gao, W. / Shao, J. / Fan, R. / Wang, Y. / Fan, Z.

High laser-induced damage threshold HfO2 films prepared by ion-assisted electron beam evaporation

Zhang, D. / Fan, S. / Zhao, Y. / Gao, W. / Shao, J. / Fan, R. / Wang, Y. / Fan, Z.

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Access via TIB

Check availability in my library

Order at Subito €

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Document information

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Document information

Title:

High laser-induced damage threshold HfO2 films prepared by ion-assisted electron beam evaporation

Contributors:

Zhang, D. (author) / Fan, S. (author) / Zhao, Y. (author) / Gao, W. (author) / Shao, J. (author) / Fan, R. (author) / Wang, Y. (author) / Fan, Z. (author)

Published in:

APPLIED SURFACE SCIENCE ; 243 ; 234-239

Publication date:

2005-01-01

Size:

6 pages

ISSN:

0169-4332

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 621.35

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