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Low Temperature Deposition of HfO~2 Gate Insulator on SiC by Metalorganic Chemical Vapor Deposition
Low Temperature Deposition of HfO~2 Gate Insulator on SiC by Metalorganic Chemical Vapor Deposition
Low Temperature Deposition of HfO~2 Gate Insulator on SiC by Metalorganic Chemical Vapor Deposition
Hino, S. (author) / Hatayama, T. (author) / Miura, N. (author) / Ozeki, T. (author) / Tokumitsu, E. (author) / Devaty, R. P. / Larkin, D. J. / Saddow, S. E.
Silicon Carbide and Related Materials - 2005 ; 1079-1082
MATERIALS SCIENCE FORUM ; 527/529
2006-01-01
4 pages
Article (Journal)
English
DDC:
620.11
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