Selectivity and Residual Damage of Colloidal Silica Chemi-Mechanical Polishing of Silicon Carbide: Fid-Bau Portal

Selectivity and Residual Damage of Colloidal Silica Chemi-Mechanical Polishing of Silicon Carbide

Grim, J. R. / Skowronski, M. / Everson, W. J. / Heydemann, V. D.

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Selectivity and Residual Damage of Colloidal Silica Chemi-Mechanical Polishing of Silicon Carbide

Grim, J. R. / Skowronski, M. / Everson, W. J. / Heydemann, V. D.

Selectivity and Residual Damage of Colloidal Silica Chemi-Mechanical Polishing of Silicon Carbide

Grim, J. R. / Skowronski, M. / Everson, W. J. / Heydemann, V. D.

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Check availability in my library

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Document information

Title:

Selectivity and Residual Damage of Colloidal Silica Chemi-Mechanical Polishing of Silicon Carbide

Contributors:

Grim, J. R. (author) / Skowronski, M. (author) / Everson, W. J. (author) / Heydemann, V. D. (author) / Devaty, R. P. / Larkin, D. J. / Saddow, S. E.

Published in:

Silicon Carbide and Related Materials - 2005 ; 1095-1098

MATERIALS SCIENCE FORUM ; 527/529

Publication date:

2006-01-01

Size:

4 pages

ISSN:

0255-5476

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 620.11

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