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Anisotropy of chemical mechanical polishing in silicon carbide substrates
Anisotropy of chemical mechanical polishing in silicon carbide substrates
Anisotropy of chemical mechanical polishing in silicon carbide substrates
Chen, X. F. (author) / Xu, X. G. (author) / Hu, X. B. (author) / Li, J. (author) / Jiang, S. Z. (author) / Ning, L. N. (author) / Wang, Y. M. (author) / Jiang, M. H. (author)
MATERIALS SCIENCE AND ENGINEERING B -LAUSANNE- ; 142 ; 28-30
2007-01-01
3 pages
Article (Journal)
English
DDC:
620.11
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