Composition of Ta2O5 stacked films on N2O- and NH3-nitrided Si: Fid-Bau Portal

Composition of Ta2O5 stacked films on N2O- and NH3-nitrided Si

Atanassova, E. / Spassov, D. / Paskaleva, A. / Kostov, K.

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Composition of Ta2O5 stacked films on N2O- and NH3-nitrided Si

Atanassova, E. / Spassov, D. / Paskaleva, A. / Kostov, K.

Composition of Ta2O5 stacked films on N2O- and NH3-nitrided Si

Atanassova, E. / Spassov, D. / Paskaleva, A. / Kostov, K.

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Check availability in my library

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Document information

Title:

Composition of Ta2O5 stacked films on N2O- and NH3-nitrided Si

Contributors:

Atanassova, E. (author) / Spassov, D. (author) / Paskaleva, A. (author) / Kostov, K. (author)

Published in:

APPLIED SURFACE SCIENCE ; 253 ; 2841-2851

Publication date:

2006-01-01

Size:

11 pages

ISSN:

0169-4332

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 621.35

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