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    Atomic scale simulations of arsenic-vacancy complexes in germanium and silicon

    New search for: Chroneos, A.
    New search for: Grimes, R. W.
    New search for: Tsamis, C.

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    Atomic scale simulations of arsenic-vacancy complexes in germanium and silicon

    New search for: Chroneos, A.
    New search for: Grimes, R. W.
    New search for: Tsamis, C.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Atomic scale simulations of arsenic-vacancy complexes in germanium and silicon

    New search for: Chroneos, A.
    New search for: Grimes, R. W.
    New search for: Tsamis, C.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

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    Document information
    Similar titles

    Export, share and cite

    Document information
    Title:

    Atomic scale simulations of arsenic-vacancy complexes in germanium and silicon

    Contributors:

    Chroneos, A. (author) / Grimes, R. W. (author) / Tsamis, C. (author)

    Published in:

    MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING ; 9 ; 536-540

    Publication date:

    2006-01-01

    Size:

    5 pages

    ISSN:

    1369-8001

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  621.38152

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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