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Combining Conventional Lithography with Molecular Self-Assembly for Chemical Patterning
Combining Conventional Lithography with Molecular Self-Assembly for Chemical Patterning
Combining Conventional Lithography with Molecular Self-Assembly for Chemical Patterning
Anderson, M. E. (author) / Srinivasan, C. (author) / Hohman, J. N. (author) / Carter, E. M. (author) / Horn, M. W. (author) / Weiss, P. S. (author)
ADVANCED MATERIALS -DEERFIELD BEACH THEN WEINHEIM- ; 18 ; 3258-3260
2006-01-01
3 pages
Article (Journal)
English
DDC:
620.11
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