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    The influence of substrate temperature variation on tungsten oxide thin film growth in an HFCVD system

    New search for: Pal, S.
    New search for: Jacob, C.

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    The influence of substrate temperature variation on tungsten oxide thin film growth in an HFCVD system

    New search for: Pal, S.
    New search for: Jacob, C.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    The influence of substrate temperature variation on tungsten oxide thin film growth in an HFCVD system

    New search for: Pal, S.
    New search for: Jacob, C.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

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    Document information
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    Document information
    Title:

    The influence of substrate temperature variation on tungsten oxide thin film growth in an HFCVD system

    Contributors:

    Pal, S. (author) / Jacob, C. (author)

    Published in:

    APPLIED SURFACE SCIENCE ; 253 ; 3317-3325

    Publication date:

    2007-01-01

    Size:

    9 pages

    ISSN:

    0169-4332

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  621.35

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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