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Photoelectron spectroscopy (XPS) and photoelectron diffraction (XPD) studies on the system hafnium silicide and hafnium oxide on Si(100)
Photoelectron spectroscopy (XPS) and photoelectron diffraction (XPD) studies on the system hafnium silicide and hafnium oxide on Si(100)
Photoelectron spectroscopy (XPS) and photoelectron diffraction (XPD) studies on the system hafnium silicide and hafnium oxide on Si(100)
Weier, D. (author) / Fluchter, C. (author) / de Siervo, A. (author) / Schurmann, M. (author) / Dreiner, S. (author) / Berges, U. (author) / Carazzolle, M. F. (author) / Pancotti, A. (author) / Landers, R. (author) / Kleiman, G. G. (author)
MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING ; 9 ; 1055-1060
2006-01-01
6 pages
Article (Journal)
English
DDC:
621.38152
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