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Understanding deviations in lithographic patterns near interfaces: Characterization of bottom anti-reflective coatings (BARC) and the BARC-resist interface
Understanding deviations in lithographic patterns near interfaces: Characterization of bottom anti-reflective coatings (BARC) and the BARC-resist interface
Understanding deviations in lithographic patterns near interfaces: Characterization of bottom anti-reflective coatings (BARC) and the BARC-resist interface
Lenhart, J. L. (author) / Fischer, D. (author) / Sambasivan, S. (author) / Lin, E. K. (author) / Wu, W. L. (author) / Guerrero, D. J. (author) / Wang, Y. (author) / Puligadda, R. (author)
APPLIED SURFACE SCIENCE ; 253 ; 4166-4175
2007-01-01
10 pages
Article (Journal)
English
DDC:
621.35
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