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Understanding deviations in lithographic patterns near interfaces: Characterization of bottom anti-reflective coatings (BARC) and the BARC-resist interface
Understanding deviations in lithographic patterns near interfaces: Characterization of bottom anti-reflective coatings (BARC) and the BARC-resist interface
Understanding deviations in lithographic patterns near interfaces: Characterization of bottom anti-reflective coatings (BARC) and the BARC-resist interface
Lenhart, J. L. (Autor:in) / Fischer, D. (Autor:in) / Sambasivan, S. (Autor:in) / Lin, E. K. (Autor:in) / Wu, W. L. (Autor:in) / Guerrero, D. J. (Autor:in) / Wang, Y. (Autor:in) / Puligadda, R. (Autor:in)
APPLIED SURFACE SCIENCE ; 253 ; 4166-4175
01.01.2007
10 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
621.35
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